ALEXANDRIA, Va., May 1 -- United States Patent no. 11,971,555, issued on April 30, was assigned to MLOptic Corp. (Redmond, Wash.).
"Optical parallelism system for extended reality metrology" was invented by Pengfei Wu (Bellevue, Wash.), Siyuan Liang (Nanjing, China) and Wei Zhou (Sammamish, Wash.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system including an enclosure including a front end and a rear end, a first pair of apertures configured to be disposed on a front plane on the front end of the enclosure and a single optical lens system disposed between the front end and the rear end of the enclosure, wherein the first pair of apertures are configured to allow sets of light rays into the enc...